WebCPC CPC COOPERATIVE PATENT CLASSIFICATION
H05H PLASMA TECHNIQUE (fusion reactors G21B; ion-beam tubes H01J 27/00; magnetohydrodynamic generators H02K 44/08; producing X-rays involving plasma generation H05G 2/00); PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS (obtaining neutrons from radioactive sources G21, e.g. G21B, G21C, G21G); PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS (atomic clocks G04F 5/14; devices using stimulated emission H01S; frequency regulation by comparison with a reference frequency determined by energy levels of molecules, atoms, or subatomic particles H03L 7/26)
H05H 1/00 Generating plasma; Handling plasma
H05H 1/0006 ・{Investigating plasma, e.g. degree of ionisation (electron temperature)}
H05H 1/0012 ・・{by using radiation}
H05H 1/0018 ・・・{Details}
H05H 1/0025 ・・・{by using photoelectric means (H05H 1/0031 to H05H 1/0043 take precedence)}
H05H 1/0031 ・・・{by interferrometry}
H05H 1/0037 ・・・{by spectrometry (see G01N 3/00)}
H05H 1/0043 ・・・{by using infra-red or ultra-violet radiation}
H05H 1/005 ・・・{by using X-rays or alpha rays (see G01N 23/00)}
H05H 1/0056 ・・・{by using neutrons (see G01N 23/00)}
H05H 1/0062 ・・・{by using microwaves (see G01N 23/34)}
H05H 1/0068 ・・{by thermal means (see G01N 25/00)}
H05H 1/0075 ・・・{Langmuir probes}
H05H 1/0081 ・・{by electric means (see G01N 27/00, G01R)}
H05H 1/0087 ・・{by magnetic means (see G01N 27/00, G01R)}
H05H 1/0093 ・・{by acoustic, e.g. ultrasonic means (see G01N 29/02)}
H05H 1/02 ・Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma ({G21B 1/00 takes precedence;} electron optics H01J)
H05H 1/03 ・・using electrostatic fields
H05H 1/04 ・・using magnetic fields substantially generated by the discharge in the plasma
H05H 1/06 ・・・longitudinal pinch devices
H05H 1/08 ・・・Theta pinch devices {e.g. SCYLLA}
H05H 1/10 ・・using externally-applied magnetic field only {e.g. Q-machines, Yin-Yang, base-ball}
H05H 1/105 ・・・{using magnetic pumping}
H05H 1/11 ・・・using cusp configuration (H05H 1/14 takes precedence)
H05H 1/12 ・・・wherein the containment vessel forms a closed or nearly closed loop {(G21B 1/05 takes precedence)}
H05H 1/14 ・・・wherein the containment vessel is straight and has magnetic mirrors {electron mirrors G21K 1/08B}
H05H 1/16 ・・using externally-applied electric and magnetic field
H05H 1/18 ・・・wherein the field oscillate at very high frequency, e.g. in the microwave range {e.g. using cyclotron resonance}
H05H 1/20 ・・Ohmic heating
H05H 1/22 ・・for injection heating {(G21B 1/15 takes precedence)}
H05H 1/24 ・Generating plasma {(gas-filled discharge reactors H01J 37/32; nuclear fusion reactors G21B 1/00; ohmic heating H05H 1/20; injection heating H05H 1/22)}
H05H 1/2406 ・・{Dielectric barrier discharges}
H05H 1/2475 ・・{Acoustic pressure discharge}
H05H 1/26 ・・Plasma torches {(metal working with constricted arc B23K 10/00, H05H 10/02; metal spraying B05B 7/18, B05B 7/20)}
H05H 1/28 ・・・Cooling arrangements
H05H 1/30 ・・・using applied electromagnetic fields, e.g. high frequency or microwave energy (H05H 1/28 takes precedence)
H05H 1/32 ・・・using an arc (H05H 1/28 takes precedence)
H05H 1/34 ・・・・Details, e.g. electrodes, nozzles {cf. B23K 9/24}
H05H 1/3405 ・・・・・{Arc stabilising or constricting arrangements, e.g. by an additional gas flow (by externally applied magnetic fieldH05H 1/40; by using powders or liquidsH05H 1/42; using coaxial protecting fluidH05H 1/341)}
H05H 1/341 ・・・・・{using coaxial protecting fluid (arc stabilising or constricting arrangementsH05H 1/3405; introducing materials into the plasmaH05H 1/42)}
H05H 1/36 ・・・・・Circuit arrangements (H05H 1/38 ,H05H 1/40 take precedence)
H05H 1/38 ・・・・・Guiding or centering of electrodes
H05H 1/40 ・・・・・using applied magnetic fields, e.g. for fucusing or rotating the arc {cf. B23K 9/08, B23K 9/06C5}
H05H 1/42 ・・・・with provision for introducing materials into the plasma, e.g. powder, liquid (electrostatic spraying, spraying apparatus with means for charging the spray electrically B05B 5/00){cf. B23K 9/324, B05B 7/22; arc stabilising or constricting arrangements H05H 1/3405; coaxial protecting fluids H05H 1/341}
H05H 1/44 ・・・・using more than one torch
H05H 1/46 ・・using applied electromagnetic fields, e.g. high frequency or microwave energy (H05H 1/26 takes precedence)
H05H 1/48 ・・using an arc (H05H 1/26 takes precedence)
H05H 1/50 ・・・and using applied magnetic fields, e.g. for focusing or rotating the arc
H05H 1/52 ・・using exploding wires or spark gaps (H05H 1/26 takes precedence; spark gaps in general H01T)
H05H 1/54 ・Plasma accelerators
H05H 3/00 Production or acceleration of neutral particle beams, e.g. molecular or atomic beams
H05H 3/02 ・Molecular or atomic beam generation {(charge exchange devices G21K 1/14; polarising devices G21K 1/16; using resonance or molecular beams for analysing or investigating materials G01N 24/002; atomic clock G04F 5/14; beam masers H01S 1/06)}
H05H 3/04 ・Acceleration by electromagnetic wave pressure
H05H 3/06 ・Generating neutron beams (targets for producing nuclear reactions H05H 6/00; neutron sources G21G 4/02)
H05H 5/00 Direct voltage accelerators; Accelerators using single pulses (H05H 3/06 takes precedence)
H05H 5/02 ・Details (targets for producing nuclear reactions H05H 6/00)
H05H 5/03 ・・Accelerating tubes (vessels or containers of electric discharge tubes with improved potential distribution over surface of vessel H01J 5/06; shields of X-ray tubes associated with vessels or containers H01J 35/16)
H05H 5/04 ・{energised by electrostatic generators}
H05H 5/042 ・・{of the van de Graaf type}
H05H 5/045 ・・{High voltage cascades, e.g. Greinacher cascade}
H05H 5/047 ・・{Pulsed generators}
H05H 5/06 ・{Multistage accelerators}
H05H 5/063 ・・{Tandems}
H05H 5/066 ・・{Onion-like structures}
H05H 5/08 ・Particle accelerators using step-up transformers, e.g. resonance transformers
H05H 6/00 Targets for producing nuclear reactions (supports for targets or objects to be irradiated G21K 5/08){preparation of tritium C01B 4/00}; {targets, e.g. pellets for fusion reactions by laser or charged particles beam injection H05H 1/22}
H05H 6/005 ・{Polarised targets (polarising devices, e.g. for obtaining a polarised ion beam G21K 1/16)}
H05H 7/00 Details of devices of the types covered by groups H05H 9/00, H05H 11/00, H05H 13/00
H05H 7/001 ・{Arrangements for beam delivery or irradiation (irradiation systems per se G21K 5/00)}
H05H 7/02 ・Circuits or systems for supplying or feeding radio-frequency energy (radio-frequency generators H03B)
H05H 7/04 ・Magnet systems {e.g. undulators, wigglers (free-electron laser H01S 3/0903)}; Energisation thereof
H05H 7/06 ・Two-beam arrangements; Multi-beam arrangements {storage rings}; Electron rings
H05H 7/08 ・Arrangements for injecting particles into orbits
H05H 7/10 ・Arrangements for ejecting particles from orbits
H05H 7/12 ・Arrangements for varying final energy of beam
H05H 7/14 ・Vacuum chambers (H05H 5/03 takes precedence)
H05H 7/16 ・・of the waveguide type
H05H 7/18 ・・Cavities; Resonators {(travelling-wave tubes H01J 23/18; hyperfrequency cavities in general H01P 7/04, H01P 7/06)}
H05H 7/20 ・・・with superconductive walls
H05H 7/22 ・Details of linear accelerators, e.g. drift tubes (H05H 7/02 to H05H 7/20 take precedence)
H05H 9/00 Linear accelerators
H05H 9/005 ・{Dielectric wall accelerators}
H05H 9/02 ・Travelling-wave linear accelerators {travelling-wave tubes H01J 25/34}
H05H 9/04 ・Standing-wave linear accelerators
H05H 9/041 ・・{Hadron LINACS}
H05H 9/042 ・・・{Drift tube LINACS}
H05H 9/044 ・・・{Coupling cavity LINACS, e.g. side coupled}
H05H 9/045 ・・・{Radio frequency quadrupoles}
H05H 9/047 ・・・{Hybrid systems}
H05H 9/048 ・・{Lepton LINACS}
H05H 11/00 Magnetic induction accelerators, e.g. betatrons
H05H 11/02 ・Air-cored betatrons
H05H 11/04 ・Biased betatrons
H05H 13/00 Magnetic resonance accelerators; Cyclotrons {(strophotrons, turbine tubes H01J 25/62)}
H05H 13/005 ・{Cyclotrons}
H05H 13/02 ・Synchrocyclotrons, i.e. frequency modulated cyclotrons
H05H 13/04 ・Synchrotrons
H05H 13/06 ・Air-cored magnetic resonance accelerators
H05H 13/08 ・Alternating-gradient magnetic resonance accelerators
H05H 13/085 ・・{Fixed-field alternating gradient accelerators [FFAG}]
H05H 13/10 ・Accelerators comprising one or more linear accelerating sections and bending magnets or the like to return the charged particles in a trajectory parallel to the first accelerating section, e.g. microtrons
H05H 15/00 Methods or devices for acceleration of charged particles not otherwise provided for
H05H 2001/00 Generating plasma; Handling plasma
H05H 2001/24 ・Generating plasma {(gas-filled discharge reactors H01J 37/32; nuclear fusion reactors G21B 1/00; ohmic heating H05H 1/20; injection heating H05H 1/22)}
H05H 2001/2406 ・・{Dielectric barrier discharges}
H05H 2001/2412 ・・・the dielectric being interposed between the electrodes
H05H 2001/2418 ・・・the electrodes being embedded in the dielectric
H05H 2001/2425 ・・・the electrodes being flush with the dielectric
H05H 2001/2431 ・・・Cylindrical electrodes
H05H 2001/2437 ・・・Multilayer systems
H05H 2001/2443 ・・・Flow through, i.e. the plasma fluid flowing in a dielectric tube
H05H 2001/245 ・・・・Internal electrodes
H05H 2001/2456 ・・・・External electrodes
H05H 2001/2462 ・・・・Ring electrodes
H05H 2001/2468 ・・・・Spiral electrodes
H05H 2001/2475 ・・{Acoustic pressure discharge}
H05H 2001/2481 ・・・Piezoelectric actuators
H05H 2001/2487 ・・・Mechanical actuators
H05H 2001/2493 ・・・Horns
H05H 2001/26 ・・Plasma torches {(metal working with constricted arc B23K 10/00, H05H 10/02; metal spraying B05B 7/18, B05B 7/20)}
H05H 2001/32 ・・・using an arc (H05H 1/28 takes precedence)
H05H 2001/34 ・・・・Details, e.g. electrodes, nozzles {cf. B23K 9/24}
H05H 2001/3415 ・・・・・indexing scheme associated with 1/34
H05H 2001/3421 ・・・・・・transferred arc mode
H05H 2001/3426 ・・・・・・pilot arc
H05H 2001/3431 ・・・・・・coaxial cylindrical electrodes
H05H 2001/3436 ・・・・・・hollow cathode with internal coolant flow
H05H 2001/3442 ・・・・・・cathode with inserted tip
H05H 2001/3447 ・・・・・・rod-like cathode
H05H 2001/3452 ・・・・・・supplementary electrodes between cathode and anode, e.g. cascade
H05H 2001/3457 ・・・・・・nozzle protection devices
H05H 2001/3463 ・・・・・・oblique nozzle
H05H 2001/3468 ・・・・・・vortex generator
H05H 2001/3473 ・・・・・・safety means
H05H 2001/3478 ・・・・・・geometrical details
H05H 2001/3484 ・・・・・・convergent/divergent nozzle
H05H 2001/3489 ・・・・・・contact starting
H05H 2001/3494 ・・・・・・discharge parameter control
H05H 2001/46 ・・using applied electromagnetic fields, e.g. high frequency or microwave energy (H05H 1/26 takes precedence)
H05H 2001/4607 ・・・Microwave discharges
H05H 2001/4615 ・・・・Surface waves
H05H 2001/4622 ・・・・Waveguides
H05H 2001/463 ・・・・Antennas or applicators
H05H 2001/4637 ・・・・Cables
H05H 2001/4645 ・・・Radiofrequency discharges
H05H 2001/4652 ・・・・Inductively coupled
H05H 2001/466 ・・・・・Electrodes
H05H 2001/4667 ・・・・・Coiled antennas
H05H 2001/4675 ・・・・Capacitively coupled
H05H 2001/4682 ・・・・Associated power generators, e. G. Circuits, matching networks
H05H 2001/469 ・・・Flow through, i.e the plasma fluid flowing in a non-dielectric vessel
H05H 2001/4692 ・・・・dielectric barrier discharge (H05H 1/2406 takes precedence)
H05H 2001/4695 ・・・・Arc discharge
H05H 2001/4697 ・・・・Glow discharge
H05H 2001/48 ・・using an arc (H05H 1/26 takes precedence)
H05H 2001/481 ・・・Corona discharges
H05H 2001/483 ・・・・Pointed electrodes
H05H 2001/485 ・・・・Cylindrical electrodes, e.g. Rotary drums electrodes
H05H 2001/486 ・・・・Filamentary electrodes
H05H 2001/488 ・・・・Segmented electrodes
H05H 2006/00 Targets for producing nuclear reactions (supports for targets or objects to be irradiated G21K 5/08){preparation of tritium C01B 4/00}; {targets, e.g. pellets for fusion reactions by laser or charged particles beam injection H05H 1/22}
H05H 2006/002 ・Windows
H05H 2006/007 ・Radiation protection arrangements , e.g. screens
H05H 2007/00 Details of devices of the types covered by groups H05H 9/00, H05H 11/00, H05H 13/00
H05H 2007/001 ・{Arrangements for beam delivery or irradiation (irradiation systems per se G21K 5/00)}
H05H 2007/002 ・・for modifying beam trajectory , e.g. gantries
H05H 2007/004 ・・for modifying beam energy, e.g. spread out Bragg peak devices
H05H 2007/005 ・・for modifying beam emittance , e.g. stochastic cooling devices, stripper foils
H05H 2007/007 ・・for focusing the beam to irradiation target
H05H 2007/008 ・・for measuring beam parameters
H05H 2007/02 ・Circuits or systems for supplying or feeding radio-frequency energy (radio-frequency generators H03B)
H05H 2007/022 ・・Pulsed systems
H05H 2007/025 ・・Radiofrequency systems
H05H 2007/027 ・・Microwave systems
H05H 2007/04 ・Magnet systems {e.g. undulators, wigglers (free-electron laser H01S 3/0903)}; Energisation thereof
H05H 2007/041 ・・for beam bunching , e.g. undulators
H05H 2007/043 ・・for beam focusing
H05H 2007/045 ・・for beam bending
H05H 2007/046 ・・for beam deflection
H05H 2007/048 ・・for modifying beam trajectory , e.g. gantry systems
H05H 2007/06 ・Two-beam arrangements; Multi-beam arrangements {storage rings}; Electron rings
H05H 2007/065 ・・Multi-beam merging , e.g. funneling
H05H 2007/08 ・Arrangements for injecting particles into orbits
H05H 2007/081 ・・Sources
H05H 2007/082 ・・・Ion sources, e.g. ECR, duoplasmatron, PIG, laser sources
H05H 2007/084 ・・・Electron sources
H05H 2007/085 ・・by electrostatic means
H05H 2007/087 ・・by magnetic means
H05H 2007/088 ・・by mechanical means, e.g. stripping foils
H05H 2007/12 ・Arrangements for varying final energy of beam
H05H 2007/122 ・・by electromagnetic means , e.g. RF cavities
H05H 2007/125 ・・by mechanical means , e.g. stripping foils
H05H 2007/127 ・・by emittance variation , e.g. stochastic cooling
H05H 2007/22 ・Details of linear accelerators, e.g. drift tubes (H05H 7/02 to H05H 7/20 take precedence)
H05H 2007/222 ・・drift tubes
H05H 2007/225 ・・coupled cavities arrangements
H05H 2007/227 ・・power coupling , e.g. coupling loops
H05H 2240/00 Test
H05H 2240/10 ・at atmospheric pressure
H05H 2240/20 ・Non-thermal plasma
H05H 2242/00 Auxiliary systems
H05H 2242/10 ・Cooling arrangements
H05H 2242/1005 ・・Power supply other than for plasma torches
H05H 2245/00 Test
H05H 2245/104 ・spiral electrodes
H05H 2245/12 ・Applications
H05H 2245/121 ・・treatment of exhaust gas, e.g. Ambient air, ozonizers
H05H 2245/1215 ・・・Exhaust gas
H05H 2245/122 ・・medical applications {e.g. plasma scalpels, blades, bistouri}
H05H 2245/1225 ・・・Sterilization of objects
H05H 2245/123 ・・surface treatments
H05H 2245/1235 ・・・coating of large volume items
H05H 2245/124 ・・production of nanostructures
H05H 2245/125 ・・portable devices
H05H 2277/00 Applications
H05H 2277/10 ・Medical devices
H05H 2277/11 ・・Radiotherapy
H05H 2277/113 ・・・Diagnostic systems
H05H 2277/116 ・・・Isotope production
H05H 2277/12 ・Ion implantation
H05H 2277/13 ・High energy applications , e.g. fusion
H05H 2277/14 ・Portable devices
H05H 2277/1405 ・・Detection systems
--- Edited by Muguruma Professional Engineer Office(C), 2013 ---