WebCPC CPC COOPERATIVE PATENT CLASSIFICATION

G02F　DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH IS MODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THE DEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY, COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g. SWITCHING, GATING, MODULATING OR DEMODULATING; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS (optical transfer means between sensing member and indicating or recording part in connection with measuring G01D 5/26; devices in which mathematical operations are carried out with optical elements G06E 3/00, {G06E 3/001}; electrical signal transmission systems using optical means to convert the input signal G08C 19/36; information-recording by electric or magnetic means and reproducing by sensing optical properties G11B 11/00; static stores using optical elements G11C 13/04; transmission systems employing electromagnetic waves other than radio waves, e.g. light, infra-red radiation, H04B 10/00; optical multiplex systems H04J 14/00; pictorial communication, e.g. television H04N)

G02F 1/00 Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating, or modulating; Non-linear optics (thermometers using change of colour or translucency G01K 11/12; using changes in fluorescence G01K 11/32; light guide devices G02B 6/00; optical devices or arrangements using movable or deformable elements for controlling light independent of the light source G02B 26/00; control of light in general G05D 25/00; visible signalling systems G08B 5/00; indicating arrangements for variable information by selection or combination of individual elements G09F 9/00; control arrangements or circuits for visual indicators other than cathode-ray tubes G09G 3/00; control of light sources H01S 3/10, H05B 33/08, H05B 35/00 to H05B 43/00; {photochromic filters G02B 5/23; optical logic elements G02F 3/00})

G02F 1/0009 ・{Materials therefor}

G02F 1/0018 ・・{Electro-optical materials}

G02F 1/0027 ・・・{with ferro-electric properties (domain inversion in ferro-electric materials G02F 1/3558; ferro-electric materials in general H01G 7/02)}

G02F 1/0036 ・・{Magneto-optical materials (magnetic materials in general H01F)}

G02F 1/0045 ・・{Liquid crystals as far as the physical properties are concerned (chemical composition and properties of liquid crystals C09K 19/00)}

G02F 1/0054 ・・{Structure, phase transitions, NMR, ESR, Moessbauer spectra}

G02F 1/0063 ・・{Optical properties e.g. absorption, reflection, non-linear effects, birefringence (non linear optics in general G02F 1/35)}

G02F 1/0072 ・・{Mechanical, acoustic, electro-elastic, magneto-elastic properties}

G02F 1/0081 ・・{Electric or magnetic properties}

G02F 1/009 ・・{Thermal properties (thermometers using change of colour or translucency G01K 11/12; radiation pyrometry G01J 5/00)}

G02F 1/01 ・for the control of the intensity, phase, polarisation or colour (G02F 1/29, G02F 1/35 take precedence; polarising elements per se G02B 5/30; static storage per se G11C; image tube screens acting as light valves by shutter operation H01J 29/12; such screens acting by discoloration H01J 29/14; {projection arrangements for television image reproduction, e.g. using eidophor H04N 5/74; recording by light G11B 7/00 to G11B 11/00})

G02F 1/0102 ・・{Constructional details (G02F 1/1306, G02F 1/133 take precedence)}

G02F 1/0105 ・・・{Illumination devices (for liquid crystal cells G02F 1/13357; for display devices for electronic time pieces G04G 9/0041)}

G02F 1/0107 ・・・{Gaskets, spacers, sealing of the cell; Filling and closing of the cell (for liquid crystal cells G02F 1/1339, G02F 1/1341; for electrochromic or electrolytic cells G02F 1/161)}

G02F 1/011 ・・{in optical waveguides (G02F 1/0134, G02F 1/01708, G02F 1/025, G02F 1/035, G02F 1/0508, G02F 1/0553, G02F 1/065, G02F 1/073, G02F 1/095, G02F 1/125, G02F 1/1326, G02F 1/225 take precedence; optical waveguides in general G02B 6/00)}

G02F 1/0115 ・・・{in optical fibres}

G02F 1/0118 ・・・・{by controlling the evanescent coupling of light from a fibre into an active, e.g. electro-optic, overlay}

G02F 1/0121 ・・{Operation of the device; Circuit arrangements not otherwise provided for (G02F 1/0327, G02F 1/0516, G02F 1/076, G02F 1/092, G02F 1/113, G02F 1/13306, G02F 1/163 take precedence)}

G02F 1/0123 ・・・{Circuits for the control or stabilisation of the bias voltage, e.g. automatic bias control (ABC) feedback loops}

G02F 1/0126 ・・{by another light beam, i.e. opto-optical modulation (G02F 1/01716, G02F 1/0338, G02F 1/0533, G02F 1/0541, G02F 1/0558, G02F 1/135, G02F 1/293 take precedence)}

G02F 1/0128 ・・{based on electro-mechanical, magneto-mechanical, elasto-optic effects}

G02F 1/0131 ・・・{based on elasto-optic, i.e. photoelastic effect, e.g. mechanically induced birefringence (acousto-optic devices G02F 1/11)}

G02F 1/0134 ・・・・{in optical waveguides}

G02F 1/0136 ・・{for the control of polarisation, e.g. state of polarisation (SOP) control, polarisation scrambling, TE-TM mode conversion or separation (G02F 1/0353 takes precedence)}

G02F 1/0147 ・・{based on thermo-optic effects (G02F 1/132 takes precedence; tenebrescent compositions C09K 9/00; radiation pyrometry G01J 5/00; thermometers using change of colour or translucency G01K 11/12)}

G02F 1/015 ・・based on semiconductor elements with at least one potential jump barrier, e.g. PN, PIN junction (G02F 1/03 takes precedence)

G02F 1/017 ・・・Structures with periodic or quasi periodic potential variation, e.g. superlattices, quantum wells

G02F 1/01708 ・・・・{in an optical wavequide structure}

G02F 1/01716 ・・・・{Optically controlled superlattice or quantum well devices}

G02F 1/01725 ・・・・{with a non-rectangular quantum well structure, e.g. coupled, graded, stepped quantum wells}

G02F 1/025 ・・・in an optical waveguide structure (G02F 1/017, {G02F 1/2257} take precedence)

G02F 1/03 ・・based on ceramics or electro-optical crystals, e.g. exhibiting Pockels effect or Kerr effect (G02F 1/061 takes precedence)

G02F 1/0305 ・・・{Constructional arrangements (G02F 1/0327 to G02F 1/05 take precedence)}

G02F 1/0311 ・・・・{Structural association of optical elements, e.g. lenses, polarizers, phase plates, with the crystal}

G02F 1/0316 ・・・・{Electrodes}

G02F 1/0322 ・・・・{Arrangements comprising two or more independently controlled crystals}

G02F 1/0327 ・・・{Operation of the cell; Circuit arrangements (G02F 1/05 takes precedence)}

G02F 1/0333 ・・・{addressed by a beam of charged particles e.g. directed to an adjacent layer exhibiting secondary emission or bombardment-induced conductivity effect (G02F 1/05 takes precedence; electrography, electrophotography G03G; screens for cathode ray tubes acting as light valves H01J 29/12)}

G02F 1/0338 ・・・{structurally associated with a photoconductive layer or having photo-refractive properties (G02F 1/05 takes precedence)}

G02F 1/0344 ・・・{controlled by a high-frequency electromagnetic wave component in an electric waveguide (G02F 1/0356, G02F 1/05, G02F 1/2255, G02F 1/3134 take precedence)}

G02F 1/035 ・・・in an optical waveguide structure

G02F 1/0353 ・・・・{involving an electro-optic TE-TM mode conversion}

G02F 1/0356 ・・・・{controlled by a high-frequency electromagnetic wave component in an electric waveguide structure}

G02F 1/05 ・・・with ferro-electric properties (G02F 1/035, G02F 1/055 take precedence; {domain inversion in ferro-electric materials G02F 1/3558; ferro-electric digital stores G11C 11/22})

G02F 1/0508 ・・・・{specially adapted for gating or modulating in optical waveguides}

G02F 1/0516 ・・・・{Operation of the cell; Circuit arrangements}

G02F 1/0525 ・・・・{addressed by a beam of charged particles, e.g. directed to an adjacent layer exhibiting secondary emission or bombardment-induced conductivity effect (electrography, electrophotography G03G; screens for cathode-ray tubes acting as light valves H01J 29/12)}

G02F 1/0533 ・・・・{structurally associated with a photo-conductive layer}

G02F 1/0541 ・・・・{using photo-refractive effects (holography G03H; electro-optical digital static stores using an interference pattern G11C 13/044)}

G02F 1/055 ・・・the active material being a ceramic (G02F 1/035 takes precedence)

G02F 1/0551 ・・・・{Constructional details}

G02F 1/0553 ・・・・{specially adapted for gating or modulating in optical waveguides}

G02F 1/0555 ・・・・{Operation of the cell; Circuit arrangements}

G02F 1/0556 ・・・・{specially adapted for a particular application}

G02F 1/0558 ・・・・{structurally associated with a photoconductive layer or exhibiting photo-refractive properties}

G02F 1/061 ・・based on electro-optical organic material (G02F 1/07, {G02F 1/13} take precedence)

G02F 1/065 ・・・in an optical waveguide structure

G02F 1/07 ・・based on electro-optical liquids exhibiting Kerr effect

G02F 1/073 ・・・{specially adapted for gating or modulating in optical waveguides}

G02F 1/076 ・・・{Operation of the cell; Circuit arrangements}

G02F 1/09 ・・based on magneto-optical elements, e.g. exhibiting Faraday effect

G02F 1/091 ・・・{based on magneto-absorption or magneto-reflection}

G02F 1/092 ・・・{Operation of the cell; Circuit arrangements}

G02F 1/093 ・・・{used as non-reciprocal devices, e.g. optical isolators, circulators (G02F 1/0955 takes precedence)}

G02F 1/095 ・・・in an optical waveguide structure

G02F 1/0955 ・・・・{used as non-reciprocal devices, e.g. optical isolators, circulators}

G02F 1/11 ・・based on acousto-optical elements, e.g. using variable diffraction by sound or like mechanical waves ({elasto-optic effect without wave propagation G02F 1/0131;} acousto-optical deflection G02F 1/33)

G02F 1/113 ・・・{Circuit or control arrangements}

G02F 1/116 ・・・{using an optically anisotropic medium, wherein the incident and the diffracted light waves have different polarizations, e.g. acousto-optic tunable filter (AOTF) (G02F 1/125 takes precedence)}

G02F 1/125 ・・・in an optical waveguide structure

G02F 1/13 ・・based on liquid crystals, e.g. single liquid crystal display cells (liquid crystal materials C09K 19/00)

G02F 1/1303 ・・・{Apparatus specially adapted to the manufacture of LCDs }

G02F 1/1306 ・・・{Details (not used, see sub-groups)}

G02F 1/1309 ・・・・{Repairing; Testing (testing of optical apparatus G01M 11/00; electronic testing of displays or display drivers, e.g. of LCDs, G09G 3/006)}

G02F 1/1313 ・・・{specially adapted for a particular application}

G02F 1/132 ・・・{Thermal activation of liquid crystals exhibiting a thermo-optic effect (thermometers using change of colour or translucency of liquid crystals G01K 11/165; thermally addressed liquid crystal elements in a matrix G09G 3/3603)}

G02F 1/1323 ・・・{Arrangements for providing a switchable viewing angle }

G02F 1/1326 ・・・{Liquid crystal optical waveguides or liquid crystal cells specially adapted for gating or modulating between optical waveguides }

G02F 1/133 ・・・Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements (arrangements or circuits for control of liquid crystal elements in a {segment display or a} matrix, not structurally associated with these elements, {respectively G09G 3/18 and}G09G 3/36)

G02F 1/13306 ・・・・{Circuit arrangements or driving methods for the control of single liquid crystal cells (G02F 1/132, G02F 1/133382 take precedence)}

G02F 1/13318 ・・・・・{Circuits comprising a photodetector}

G02F 1/1333 ・・・・Constructional arrangements; {Manufacturing methods}(G02F 1/135, G02F 1/136 take precedence)

G02F 1/133305 ・・・・・{Flexible substrates, e.g. plastics, organic film}

G02F 1/133308 ・・・・・{LCD panel immediate support structure, e.g. front and back frame or bezel }

G02F 1/13334 ・・・・・{Plasma addressed liquid crystal cells [PALC}(plasma panels H01J 17/49)]

G02F 1/133345 ・・・・・{Insulating layers (G02F 1/1335, G02F 1/1337, G02F 1/135, G02F 1/136 take precedence)}

G02F 1/133348 ・・・・・{Charged-particles, e.g. electron-beam, addressed liquid crystals cells (screen for cathode ray tubes acting as light valves H01J 29/12; electrography, electrophotography G03G)}

G02F 1/133351 ・・・・・{Manufacturing of individual cells out of a plurality of cells, e.g. by dicing}

G02F 1/13336 ・・・・・{Combining plural substrates to produce large-area displays, e.g. tiled displays}

G02F 1/133362 ・・・・・{Optically addressed liquid crystal cells (G02F 1/135 takes precedence)}

G02F 1/133365 ・・・・・{Cells in which the active layer comprises a liquid crystalline polymer (liquid crystalline polymers in general C09K 19/38)}

G02F 1/133371 ・・・・・{Cells with varying thickness of the liquid crystal layer}

G02F 1/133377 ・・・・・{Cells with plural compartments or having plurality of liquid crystal micro-cells partitioned by walls, e.g. one micro-cell per pixel}

G02F 1/13338 ・・・・・{Input devices, e.g. touch-panels (specially adapted as input devices to computers G06F 3/033; touch-panels per se G06K 11/06, keyboard switches per se H01H 13/70)}

G02F 1/133382 ・・・・・{Heating or cooling of liquid crystal cells other than for activation, e.g. circuits or arrangements for temperature control, stabilisation or uniform distribution over the cell }

G02F 1/133385 ・・・・・・{with cooling means, e.g. fans }

G02F 1/1334 ・・・・・based on polymer dispersed liquid crystals, e.g. microencapsulated liquid crystals {(compositions C09K 19/544)}

G02F 1/13342 ・・・・・・{Holographic polymer dispersed liquid crystals}

G02F 1/1335 ・・・・・Structural association of optical devices, e.g. polarisers, reflectors or illuminating devices, with the cell

G02F 1/133502 ・・・・・・{Antiglare, refractive index matching layers}

G02F 1/133504 ・・・・・・{Diffusing, scattering, diffracting elements (associated to illuminating devices G02F 1/13357)}

G02F 1/133509 ・・・・・・{Filters, e.g. light shielding masks (optical filters G02B 5/20)}

G02F 1/133512 ・・・・・・・{Light shielding layers, e.g. black matrix (G02F 1/136209 takes precedence)}

G02F 1/133514 ・・・・・・・{Colour filters (luminescent elements G02F 1/13357L)}

G02F 1/133516 ・・・・・・・・{Methods of making thereof, e.g. printing, electro-deposition, photolithography (photomechanical production of textured or patterned surfaces G03F)}

G02F 1/133524 ・・・・・・{Light-guides, e.g. fibre-optic bundles, louvered or jalousie light-guides}

G02F 1/133526 ・・・・・・{Lenses, e.g. micro-lenses, Fresnel lenses (lenses in general G02B 3/00)}

G02F 1/133528 ・・・・・・{Polarisers (polarisers per se G02B 5/30)}

G02F 1/133533 ・・・・・・・{Colour selective polarisers (G02F 1/1347 takes precedence)}

G02F 1/133536 ・・・・・・・{Reflective polarizers (G02F 1/13357P takes precedence)}

G02F 1/133553 ・・・・・・{Reflecting elements (associated to illuminating devices G02F 1/13357)}

G02F 1/133555 ・・・・・・・{Transflectors}

G02F 1/1336 ・・・・・・{Illuminating devices (in general F21V; associated with display devices for electronic watches G04G 9/0041)}

G02F 1/133602 ・・・・・・・{Direct backlight}

G02F 1/133603 ・・・・・・・・{with LEDs}

G02F 1/133604 ・・・・・・・・{with lamps}

G02F 1/133605 ・・・・・・・・{including specially adapted reflectors}

G02F 1/133606 ・・・・・・・・{including a specially adapted diffusing, scattering or light controlling members}

G02F 1/133608 ・・・・・・・・{including particular frames or supporting means}

G02F 1/133609 ・・・・・・・・{including means for improving the color mixing, e.g. white}

G02F 1/133611 ・・・・・・・・{including means for improving the brightness uniformity}

G02F 1/133615 ・・・・・・・{Edge-illuminating devices, i.e. illuminating from the side (G02B 6/0001 takes precedence)}

G02F 1/133617 ・・・・・・・{Illumination with ultra-violet light; Luminescent elements or materials associated to the cell}

G02F 1/13362 ・・・・・・・{providing polarised light, e.g. by converting a polarisation component into another one (optical systems for polarising G02B 27/28)}

G02F 1/133621 ・・・・・・・{providing coloured light (G02F 1/133617, G02F 1/133533 take precedence)}

G02F 1/13363 ・・・・・・Birefringent elements, e.g. for optical compensation

G02F 1/133632 ・・・・・・・{with refractive index ellipsoid inclined relative to the LC-layer surface}

G02F 1/133634 ・・・・・・・{the refractive index Nz perpendicular to the element surface being different from in-plane refractive indices Nx and Ny, e.g. biaxial or with normal optical axis}

G02F 1/133636 ・・・・・・・{with twisted orientation, e.g. comprising helically oriented

G02F 1/1337 ・・・・・Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers

G02F 1/133703 ・・・・・・{by introducing organic surfactant additives into the liquid crystal material (C09K 19/56 takes precedence)}

G02F 1/133707 ・・・・・・{Structures for producing distorted electric fields, e.g. bumps, protrusions, recesses, slits in pixel electrodes}

G02F 1/133711 ・・・・・・{by organic films, e.g. polymeric films}

G02F 1/133719 ・・・・・・・{with coupling agent molecules, e.g. silane}

G02F 1/133723 ・・・・・・・{Polyimide, polyamide-imide}

G02F 1/133734 ・・・・・・{by obliquely evaporated films, e.g. Si or SiO2 films}

G02F 1/133753 ・・・・・・{with different alignment orientations or pretilt angles on a same surface, e.g. for grey scale or improved viewing angle}

G02F 1/13378 ・・・・・・{by treatment of the surface, e.g. embossing, rubbing, light irradiation (G02F 1/133711, G02F 1/133734, G02F 1/133753 take precedence)}

G02F 1/133784 ・・・・・・・{by rubbing}

G02F 1/133788 ・・・・・・・{by light irradiation, e.g. linearly polarised light photo-polymerisation}

G02F 1/1339 ・・・・・Gaskets; Spacers, {also spacers with conducting properties (electric line connectors H01R)}; Sealing of the cell

G02F 1/13392 ・・・・・・{spacers dispersed on the cell substrate, e.g. spherical particles, micro-fibres}

G02F 1/13394 ・・・・・・{spacers regularly patterned on the cell subtrate, e.g. walls, pillars (G02F 1/133377 takes precedence)}

G02F 1/1341 ・・・・・Filling or closing of the cell {(G02F 1/133365, G02F 1/1334 take precedence)}

G02F 1/1343 ・・・・・Electrodes {(reflective electrodes G02F 1/133553)}

G02F 1/134309 ・・・・・・{characterised by their geometrical arrangement (G09F 9/302 takes precedence)}

G02F 1/134327 ・・・・・・・{Segmented, e.g. alpha numeric display}

G02F 1/134336 ・・・・・・・{Matrix}

G02F 1/134363 ・・・・・・・{for applying an electric field parallel to the substrate, i.e. in-plane switching (IPS)}

G02F 1/13439 ・・・・・・{characterised by their electrical, optical, physical properties; materials therefor; method of making}

G02F 1/1345 ・・・・・Conductors connecting electrodes to cell terminals

G02F 1/13452 ・・・・・・{Conductors connecting driver circuitry and terminals of panels (H01L 21/00 takes precedence; electrical details inside the cell G02F 1/133;)}

G02F 1/13454 ・・・・・・{Drivers integrated on the active matrix substrate (G02F 1/136277 takes precedence)}

G02F 1/13458 ・・・・・・{Terminal pads }

G02F 1/1347 ・・・・・Arrangement of liquid crystal layers or cells in which the final condition of one light beam is achieved by the addition of the effects of two or more layers or cells {(colour projection displays with liquid crystal valves H04N 9/3197)}

G02F 1/13471 ・・・・・・{in which all the liquid crystal cells or layers remain transparent, e.g. FLC, ECB, DAP, HAN, TN, STN, SBE-LC cells (G02F 1/13475 takes precedence)}

G02F 1/13473 ・・・・・・・{for wavelength filtering or for colour display without the use of colour mosaic filters}

G02F 1/13475 ・・・・・・{in which at least one liquid crystal cell or layer is doped with a pleochroic dye, e.g. GH-LC cell (G02F 1/13476 takes precedence)}

G02F 1/13476 ・・・・・・{in which at least one liquid crystal cell or layer assumes a scattering state}

G02F 1/135 ・・・・Liquid crystal cells structurally associated with a photoconducting or a ferro-electric layer, the properties of which can be optically or electrically varied {(G02F 1/133348 takes precedence)}

G02F 1/1354 ・・・・・{having a particular photoconducting structure or material}

G02F 1/1358 ・・・・・{the supplementary layer being a ferro-electric layer}

G02F 1/136 ・・・・Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit (G02F 1/135 takes precedence)

G02F 1/1362 ・・・・・Active matrix addressed cells {(G02F 1/134336, G02F 1/134363 take precedence)}

G02F 1/136204 ・・・・・・{Arrangements to prevent high voltage or static electricity failures}

G02F 1/136209 ・・・・・・{Light shielding layers, e.g. black matrix, incorporated in the active matrix substrate, e.g. structurally associated with the switching element}

G02F 1/136213 ・・・・・・{Storage capacitors associated with the pixel electrode}

G02F 1/136227 ・・・・・・{Through-hole connection of the pixel electrode to the active element through an insulation layer}

G02F 1/13624 ・・・・・・{having more than one switching element per pixel}

G02F 1/136259 ・・・・・・{Repairing; Defects}

G02F 1/136277 ・・・・・・{formed on a semiconductor substrate, e.g. silicon}

G02F 1/136286 ・・・・・・{Wiring, e.g. gate line, drain line}

G02F 1/1365 ・・・・・・in which the switching element is a two-electrode device {(G02F 1/136277 takes precedence)}

G02F 1/1368 ・・・・・・in which the switching element is a three-electrode device {(G02F 1/136277 takes precedence)}

G02F 1/137 ・・・characterised by a particular electro- or magneto-optical effect, e.g. field-induced phase transition, orientation effect, guest-host interaction, dynamic scattering

G02F 1/13718 ・・・・{based on a change of the texture state of a cholesteric liquid crystal}

G02F 1/13725 ・・・・{based on guest-host interaction (G02F 1/13762, G02F 1/13737, take precedence)}

G02F 1/13731 ・・・・{based on a field-induced phase transition (G02F 1/13781 takes precedence)}

G02F 1/13737 ・・・・・{in liquid crystals doped with a plechroic dye}

G02F 1/13743 ・・・・{based on electrohydrodynamic instabilities or domain formation in liquid crystals}

G02F 1/1375 ・・・・・{using dynamic scattering}

G02F 1/13762 ・・・・{containing luminescent or electroluminescent additives (luminescent materials in general C09K 11/00; compositions of liquid crystals comprising additives C09K 19/52 to C09K 19/603; electroluminescent light sources H05B 33/00)}

G02F 1/13768 ・・・・{based on magneto-optical effects}

G02F 1/13781 ・・・・{using smectic liquid crystals (G02F 1/141 takes precedence)}

G02F 1/139 ・・・・based on orientation effects in which the liquid crystal remains transparent

G02F 1/1391 ・・・・・{Bistable or multi-stable liquid crystal cells (G02F 1/141 takes precedence)}

G02F 1/1392 ・・・・・{using a field-induced sign-reversal of the dielectric anisotropy}

G02F 1/1393 ・・・・・{the birefringence of the liquid crystal being electrically controlled, e.g. ECB-, DAP-, HAN-, PI-LC cells (G02F 1/1396, G02F 1/141 take precedence)}

G02F 1/1395 ・・・・・・{Optically compensated birefringence (OCB)- cells or PI- cells}

G02F 1/1396 ・・・・・{the liquid crystal being selectively controlled between a twisted state and a non-twisted state, e.g. TN-LC cell (G02F 1/141 takes precedence)}

G02F 1/1397 ・・・・・・{the twist being substantially higher than 90°, e.g. STN-, SBE-, OMI-LC cells}

G02F 1/141 ・・・・・using ferroelectric liquid crystals

G02F 1/1416 ・・・・・・{Details of the smectic layer structure, e.g. bookshelf, chevron, C1 and C2}

G02F 1/1418 ・・・・・・{using smectic liquid crystals, e.g. based on the electroclinic effect }

G02F 1/15 ・・based on electrochromic elements {(electrochromic materials C09K 9/00)}

G02F 1/1506 ・・・{based on electrolytic deposition of a non-organic material on or in the vicinity of an electrode}

G02F 1/1508 ・・・・{using a solid electrolyte}

G02F 1/1521 ・・・{based on oxidation reduction in organic liquid solutions, e.g. viologens solutions}

G02F 1/1523 ・・・{based on solid inorganic materials, e.g. transition metal compounds, e.g. in combination with a liquid or solid electrolyte (G02F 1/1506 takes precedence)}

G02F 1/1525 ・・・・{characterised by a particular ion transporting layer, e.g. electrolyte (H01M 6/18, H01M 10/08 take precedence)}

G02F 1/1527 ・・・・{based on iridium oxide or hydroxide}

G02F 1/153 ・・・Constructional arrangements

G02F 1/1533 ・・・・{structural features not otherwise provided for }

G02F 1/155 ・・・・Electrodes

G02F 1/157 ・・・・Structural association of optical devices, e.g. reflectors or illuminating devices, with the cell

G02F 1/161 ・・・・Gaskets; Spacers; Sealing of the cell; Filling or closing of the cell

G02F 1/163 ・・・Operation of electrochromic cells; Circuit arrangements

G02F 1/167 ・・based on electrophoresis

G02F 1/17 ・・based on variable absorption elements (G02F 1/015 to G02F 1/167 take precedence; {tenebrescent compositions C09K 9/00})

G02F 1/172 ・・・{based on a suspension of orientable dipolar particles, e.g. suspended particles displays}

G02F 1/174 ・・・{based on absorption band-shift, e.g. Stark - or Franz-Keldysh effect (G02F 1/015, G02F 1/178 take precedence)}

G02F 1/176 ・・・{using acid- based indicators}

G02F 1/178 ・・・{based on pressure effects (G02F 1/195 takes precedence)}

G02F 1/19 ・・based on variable reflection or refraction elements ({G02F 1/01M3}, G02F 1/015 to G02F 1/167 take precedence)

G02F 1/195 ・・・{by using frustrated reflection (digital reflection using controlled total internal reflection G02F 1/315)}

G02F 1/21 ・・by interference

G02F 1/216 ・・・{using liquid crystals, e.g. liquid crystal Fabry-Perot filters}

G02F 1/218 ・・・{using semi-conducting materials}

G02F 1/225 ・・・in an optical waveguide structure

G02F 1/2252 ・・・・{in optical fibres}

G02F 1/2255 ・・・・{controlled by a high-frequency electromagnetic component in an electric waveguide structure}

G02F 1/2257 ・・・・{the optical waveguides being made of semiconducting material}

G02F 1/23 ・・for the control of the colour (G02F 1/03 to G02F 1/21 take precedence)

G02F 1/25 ・・・as to hue or predominant wavelength

G02F 1/29 ・for the control of the position or the direction of light beams, i.e deflection ({optical coupling means G02B 6/26; optical-mechanical scanning in general G02B 26/10}; static stores with electric or magnetic read-in and optical read-out G11C; lasers provided with means to change the location from which, or the direction in which, laser radiation is emitted H01S 3/101)

G02F 1/292 ・・{by controlled diffraction or phased-array beam steering (controlled diffraction for optical switching G02F 1/31)}

G02F 1/293 ・・{by another light beam, i.e. opto-optical deflection}

G02F 1/295 ・・{Analog deflection from or} in an optical waveguide structure]

G02F 1/2955 ・・・{by controlled diffraction or phased-array beam steering (controlled diffraction for optical waveguide switching G02F 1/313)}

G02F 1/31 ・・Digital deflection, {i.e. optical switching}(G02F 1/33 takes precedence)

G02F 1/313 ・・・in an optical waveguide structure

G02F 1/3131 ・・・・{in optical fibres}

G02F 1/3132 ・・・・{of directional coupler type (all-optical modulation, gating or switching using a non-linear directional coupler G02F 1/3521)}

G02F 1/3133 ・・・・・{the optical waveguides being made of semiconducting materials}

G02F 1/3134 ・・・・・{controlled by a high-frequency electromagnetic wave component in an electric waveguide structure}

G02F 1/3136 ・・・・{of interferometric switch type}

G02F 1/3137 ・・・・{with intersecting or branching waveguides, e.g. X-switches and Y-junctions}

G02F 1/3138 ・・・・・{the optical waveguides being made of semiconducting materials}

G02F 1/315 ・・・based on the use of controlled internal reflection

G02F 1/33 ・・Acousto-optical deflection devices {(circuit or control arrangements therefor G02F 1/113)}

G02F 1/332 ・・・{comprising a plurality of transducers on the same crystal surface, e.g. multi-channel Bragg cell}

G02F 1/335 ・・・having an optical waveguide structure

G02F 1/35 ・Non-linear optics (optical bistable devices G02F 3/02; lasers using stimulated Brillouin or Raman effect H01S 3/30)

G02F 1/3501 ・・{Constructional arrangements of non-linear optical devices, e.g. shape of non-linear crystals (constructional arrangements of electro-optic devices G02F 1/0305)}

G02F 1/3511 ・・{Self-focusing or self-trapping of light; Light-induced birefringence; Induced optical Kerr-effect (photorefractive effects of electro-optic crystals G02F 1/0338, G02F 1/0541, of ceramics G02F 1/0558; opto-optical modulation G02F 1/0126; opto-optical deflection G02F 1/293)}

G02F 1/3513 ・・・{Soliton propagation}

G02F 1/3515 ・・{All-optical modulation, gating, switching, e.g. control of a light beam by another light beam (G02F 1/353, G02F 1/37, G02F 1/39 take precedence)}

G02F 1/3517 ・・・{using an interferometer}

G02F 1/3519 ・・・・{of Sagnac type, i.e. nonlinear optical loop mirror (NOLM)}

G02F 1/3521 ・・・{using a directional coupler}

G02F 1/3523 ・・{Non-linear absorption changing by light e.g. bleaching (laser Q-switching using bleachable media H01S 3/113)}

G02F 1/3525 ・・{Optical damage}

G02F 1/3526 ・・{using two-photon emission or absorption processes (Raman effect H01S 3/30)}

G02F 1/353 ・・{Frequency conversion, i.e. wherein a light beam with frequency components different from those of the incident light beams is generated (second harmonic generation G02F 1/37; optical parametric generation or amplification G02F 1/39; transferring the modulation of modulated light G02F 2/004; optical pumping of a laser by another laser H01S 3/094; nonlinear optical devices inside a laser cavity H01S 3/108)}

G02F 1/3532 ・・・{Arrangements of plural nonlinear devices for generating multi-colour light beams, e.g. arrangements of SHG, SFG, OPO devices for generating RGB light beams}

G02F 1/3534 ・・・{Three-wave interaction, e.g. sum-difference frequency generation (G02F 1/3532 takes precedence)}

G02F 1/3536 ・・・{Four-wave interaction}

G02F 1/3538 ・・・・{for optical phase conjugation (H01S 3/10076 takes precedence)}

G02F 1/3544 ・・・{Particular phase matching techniques}

G02F 1/355 ・・characterised by the materials used

G02F 1/3551 ・・・{Crystals}

G02F 1/3553 ・・・・{having the formula MTiOYO4, where M=K, Rb, TI, NH4 or Cs and Y=P or As, e.g. KTP}

G02F 1/3555 ・・・{Glasses}

G02F 1/3556 ・・・{Semiconductor materials, e.g. quantum wells}

G02F 1/3558 ・・・{Poled materials, e.g. with periodic poling; Fabrication of domain inverted structures, e.g. for quasi-phase-matching (QPM)}

G02F 1/361 ・・・Organic materials

G02F 1/3611 ・・・・{containing Nitrogen}

G02F 1/3612 ・・・・・{Heterocycles having N as heteroatom}

G02F 1/3613 ・・・・{containing Sulfur}

G02F 1/3614 ・・・・・{Heterocycles having S as heteroatom}

G02F 1/3615 ・・・・{containing polymers}

G02F 1/3616 ・・・・・{having the non-linear optical group in the main chain}

G02F 1/3617 ・・・・・{having the non-linear optical group in a side chain}

G02F 1/3618 ・・・・{Langmuir Blodgett Films}

G02F 1/3619 ・・・・{Organometallic compounds}

G02F 1/365 ・・in an optical waveguide structure (G02F 1/377, {G02F 1/395} take precedence)

G02F 1/37 ・・for second-harmonic generation {(G02F 1/3532 takes precedence)}

G02F 1/377 ・・・in an optical waveguide structure

G02F 1/3775 ・・・・{with a periodic structure, e.g. domain inversion, for quasi-phase-matching (QPM) (G02F 1/383 takes precedence)}

G02F 1/383 ・・・・of the optical fibre type

G02F 1/39 ・・for parametric generation or amplification of light, infra-red or ultra-violet waves ({G02F 1/3532 takes precedence;} electrical parametric amplifiers H03F 7/00)

G02F 1/395 ・・・{in optical waveguides}

G02F 1/397 ・・・{Amplification of light by wave mixing involving an interference pattern, e.g. using photorefractive material}

G02F 2/00 Demodulating light; Transferring the modulation of modulated light; Frequency-changing of light (G02F 1/35 takes precedence; photoelectric detecting or measuring devices G01J, H01J 40/00, H01L 31/00; demodulating laser arrangements {e.g. switching, gating}H01S 3/10; demodulation or transference of modulation of modulated electro-magnetic waves in general H03D 9/00)

G02F 2/002 ・{using optical mixing (homodyne, heterodyne systems H04B 10/148)}

G02F 2/004 ・{Transferring the modulation of modulated light, i.e. transferring the information from one optical carrier of a first wavelength to a second optical carrier of a second wavelength, e.g. all-optical wavelength converter}

G02F 2/02 ・Frequency-changing of light, e.g. by quantum counters (luminescent materials C09K 11/00)

G02F 3/00 Optical logic elements ({optical computing G06E}; electric pulse generators using opto-electronic devices as active elements H03K 3/42; logic circuits using opto-electronic devices H03K 19/14); Optical bistable devices

G02F 3/02 ・Optical bistable devices

G02F 3/022 ・・{based on electro-, magneto- or acousto-optical elements (G02F 3/028 takes precedence)}

G02F 3/024 ・・{based on non-linear elements, e.g. non-linear Fabry-Perot cavity (G02F 3/028 takes precedence)}

G02F 3/026 ・・{based on laser effects}

G02F 3/028 ・・{based on self electro-optic effect devices (SEED)}

G02F 7/00 Optical analogue/digital converters

G02F 2001/00 Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating, or modulating; Non-linear optics (thermometers using change of colour or translucency G01K 11/12; using changes in fluorescence G01K 11/32; light guide devices G02B 6/00; optical devices or arrangements using movable or deformable elements for controlling light independent of the light source G02B 26/00; control of light in general G05D 25/00; visible signalling systems G08B 5/00; indicating arrangements for variable information by selection or combination of individual elements G09F 9/00; control arrangements or circuits for visual indicators other than cathode-ray tubes G09G 3/00; control of light sources H01S 3/10, H05B 33/08, H05B 35/00 to H05B 43/00; {photochromic filters G02B 5/23; optical logic elements G02F 3/00})

G02F 2001/01 ・for the control of the intensity, phase, polarisation or colour (G02F 1/29, G02F 1/35 take precedence; polarising elements per se G02B 5/30; static storage per se G11C; image tube screens acting as light valves by shutter operation H01J 29/12; such screens acting by discoloration H01J 29/14; {projection arrangements for television image reproduction, e.g. using eidophor H04N 5/74; recording by light G11B 7/00 to G11B 11/00})

G02F 2001/011 ・・{in optical waveguides (G02F 1/0134, G02F 1/01708, G02F 1/025, G02F 1/035, G02F 1/0508, G02F 1/0553, G02F 1/065, G02F 1/073, G02F 1/095, G02F 1/125, G02F 1/1326, G02F 1/225 take precedence; optical waveguides in general G02B 6/00)}

G02F 2001/0113 ・・・made of glass, e.g. silica-based optical waveguides

G02F 2001/0136 ・・{for the control of polarisation, e.g. state of polarisation (SOP) control, polarisation scrambling, TE-TM mode conversion or separation (G02F 1/0353 takes precedence)}

G02F 2001/0139 ・・・Polarisation scrambling; Depolarisers

G02F 2001/0142 ・・・TE-TM mode conversion

G02F 2001/0144 ・・・TE-TM mode separation

G02F 2001/015 ・・based on semiconductor elements with at least one potential jump barrier, e.g. PN, PIN junction (G02F 1/03 takes precedence)

G02F 2001/0151 ・・・modulating the refractive index

G02F 2001/0152 ・・・・by free carrier effects (Plasma)

G02F 2001/0153 ・・・・by electro-refraction (Kramers-Kronig relation)

G02F 2001/0154 ・・・・by electro-optic effects (LEO=Pockels, QEO=Kerr)

G02F 2001/0155 ・・・modulating the optical absorption

G02F 2001/0156 ・・・・by free carrier absorption

G02F 2001/0157 ・・・・by electro-absorption effects (FK, Stark, QCSE)

G02F 2001/0158 ・・・・・with blue-shift of the absorption band

G02F 2001/0159 ・・・・・with red-shift of the absorption band

G02F 2001/017 ・・・Structures with periodic or quasi periodic potential variation, e.g. superlattices, quantum wells

G02F 2001/01725 ・・・・{with a non-rectangular quantum well structure, e.g. coupled, graded, stepped quantum wells}

G02F 2001/01733 ・・・・・Coupled or double quantum wells

G02F 2001/01741 ・・・・・・Asymmetrically coupled or double quantum wells

G02F 2001/0175 ・・・・・with a spatially varied well profile, e.g. graded, stepped quantum wells

G02F 2001/01758 ・・・・・・with an asymmetric well profile, e.g. asymmetrically stepped quantum wells

G02F 2001/01766 ・・・・Strained superlattice or quantum well devices

G02F 2001/01775 ・・・・involving an intersubband transition in one well, e.g. e1->e2

G02F 2001/01783 ・・・・Quantum wire

G02F 2001/01791 ・・・・Quantum box or dot

G02F 2001/09 ・・based on magneto-optical elements, e.g. exhibiting Faraday effect

G02F 2001/094 ・・・Based on magnetophoretic effect

G02F 2001/13 ・・based on liquid crystals, e.g. single liquid crystal display cells (liquid crystal materials C09K 19/00)

G02F 2001/1316 ・・・Cleaning methods or materials for cleaning part of liquid crystal cell components during the manufacturing process

G02F 2001/133 ・・・Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements (arrangements or circuits for control of liquid crystal elements in a {segment display or a} matrix, not structurally associated with these elements, {respectively G09G 3/18 and}G09G 3/36)

G02F 2001/13306 ・・・・{Circuit arrangements or driving methods for the control of single liquid crystal cells (G02F 1/132, G02F 1/133382 take precedence)}

G02F 2001/13312 ・・・・・Circuits comprising a photodetector not for feedback

G02F 2001/13324 ・・・・・Circuits comprising a solar cell

G02F 2001/1333 ・・・・Constructional arrangements; {Manufacturing methods}(G02F 1/135, G02F 1/136 take precedence)

G02F 2001/133302 ・・・・・rigid substrate, e.g. inorganic

G02F 2001/133308 ・・・・・{LCD panel immediate support structure, e.g. front and back frame or bezel }

G02F 2001/133311 ・・・・・・Environmental protection, e.g. dust, humidity

G02F 2001/133314 ・・・・・・Back frame

G02F 2001/133317 ・・・・・・Intermediate frame, e.g. between backlight housing and front frame

G02F 2001/13332 ・・・・・・Front frame

G02F 2001/133322 ・・・・・・Mechanical guiding and alignment of LCD panel support components

G02F 2001/133325 ・・・・・・Method of assembling (G02F 2201/465 takes precedence)

G02F 2001/133328 ・・・・・・Segmented frame

G02F 2001/133331 ・・・・・・Cover glass

G02F 2001/133334 ・・・・・・Electromagnetic shield

G02F 2001/133337 ・・・・・Ion-diffusion preventing or absorbing layer

G02F 2001/133342 ・・・・・for double side displays

G02F 2001/133354 ・・・・・Arrangements for aligning or assembling the substrates

G02F 2001/133357 ・・・・・Planarisation layer

G02F 2001/133368 ・・・・・cell having two substrates with different characteristic, e.g. hickness or material

G02F 2001/133374 ・・・・・for displaying permanent signs or marks

G02F 2001/133388 ・・・・・Constructional difference between the display region and the peripheral region

G02F 2001/133391 ・・・・・Constructional arrangement for sub-divided displays

G02F 2001/133394 ・・・・・Piezoelectric element associated with the cell

G02F 2001/133397 ・・・・・for suppressing after-image or image-sticking

G02F 2001/1334 ・・・・・based on polymer dispersed liquid crystals, e.g. microencapsulated liquid crystals {(compositions C09K 19/544)}

G02F 2001/13345 ・・・・・・Network or three-dimensional gel

G02F 2001/13347 ・・・・・・Reverse mode, i.e. clear in the off-state and scattering in the on-state

G02F 2001/1335 ・・・・・Structural association of optical devices, e.g. polarisers, reflectors or illuminating devices, with the cell

G02F 2001/133504 ・・・・・・{Diffusing, scattering, diffracting elements (associated to illuminating devices G02F 1/13357)}

G02F 2001/133507 ・・・・・・・Luminance enhancement films

G02F 2001/133509 ・・・・・・{Filters, e.g. light shielding masks (optical filters G02B 5/20)}

G02F 2001/133514 ・・・・・・・{Colour filters (luminescent elements G02F 1/13357L)}

G02F 2001/133519 ・・・・・・・・overcoating

G02F 2001/133521 ・・・・・・・・Interference filters

G02F 2001/133528 ・・・・・・{Polarisers (polarisers per se G02B 5/30)}

G02F 2001/133531 ・・・・・・・Special arrangement of polariser or analyser axes

G02F 2001/133538 ・・・・・・・with a spatial distribution of the polarisation direction

G02F 2001/133541 ・・・・・・・Circular polarisers

G02F 2001/133543 ・・・・・・・Cholesteric polarisers

G02F 2001/133545 ・・・・・・・Dielectric stack polarisers

G02F 2001/133548 ・・・・・・・Wire-grid polarisers

G02F 2001/13355 ・・・・・・・Polarising beam splitters [PBS]

G02F 2001/133553 ・・・・・・{Reflecting elements (associated to illuminating devices G02F 1/13357)}

G02F 2001/133555 ・・・・・・・{Transflectors}

G02F 2001/133557 ・・・・・・・・Half-mirror

G02F 2001/13356 ・・・・・・Particular location of the optical element

G02F 2001/133562 ・・・・・・・on the viewer side

G02F 2001/133565 ・・・・・・・inside the LC element, i.e. between the cell substrates

G02F 2001/133567 ・・・・・・・on the back side

G02F 2001/1336 ・・・・・・{Illuminating devices (in general F21V; associated with display devices for electronic watches G04G 9/0041)}

G02F 2001/133601 ・・・・・・・for spatial active dimming

G02F 2001/133602 ・・・・・・・{Direct backlight}

G02F 2001/133606 ・・・・・・・・{including a specially adapted diffusing, scattering or light controlling members}

G02F 2001/133607 ・・・・・・・・・the light controlling member including light directing or refracting elements, e.g. prisms or lenses

G02F 2001/133612 ・・・・・・・・Electrical details

G02F 2001/133613 ・・・・・・・・including a particular sequence of light sources

G02F 2001/133614 ・・・・・・・the light is generated by photoluminescence, e.g. a phosphor is illuminated by UV or blue light

G02F 2001/133616 ・・・・・・・Front illuminating devices

G02F 2001/133618 ・・・・・・・for ambient light

G02F 2001/133621 ・・・・・・・{providing coloured light (G02F 1/133617, G02F 1/133533 take precedence)}

G02F 2001/133622 ・・・・・・・・colour sequential illumination

G02F 2001/133623 ・・・・・・・・Inclined coloured light beams

G02F 2001/133624 ・・・・・・・having a particular spectral emission

G02F 2001/133625 ・・・・・・・Electron stream lamps

G02F 2001/133626 ・・・・・・・providing two modes of illumination, e.g. day-night

G02F 2001/133627 ・・・・・・・・Projection-direct viewing

G02F 2001/133628 ・・・・・・・with cooling means

G02F 2001/13363 ・・・・・・Birefringent elements, e.g. for optical compensation

G02F 2001/133631 ・・・・・・・with a spatial distribution of the retardation value

G02F 2001/133633 ・・・・・・・using mesogenic materials

G02F 2001/133635 ・・・・・・・Multifunctional compensators

G02F 2001/133637 ・・・・・・・characterized by the wavelength dispersion

G02F 2001/133638 ・・・・・・・Waveplates, i.e. plates with a retardation value of lambda/n

G02F 2001/1337 ・・・・・Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers

G02F 2001/133711 ・・・・・・{by organic films, e.g. polymeric films}

G02F 2001/133715 ・・・・・・・by first depositing a monomer

G02F 2001/133726 ・・・・・・・made of a mesogenic material

G02F 2001/13373 ・・・・・・Disclination line; Reverse tilt

G02F 2001/133738 ・・・・・・for homogeneous alignment

G02F 2001/133742 ・・・・・・for homeotropic alignment

G02F 2001/133746 ・・・・・・for high pretilt angle, i.e. > 15 degrees

G02F 2001/133749 ・・・・・・for low pretilt angle, i.e. < 15 degrees

G02F 2001/133753 ・・・・・・{with different alignment orientations or pretilt angles on a same surface, e.g. for grey scale or improved viewing angle}

G02F 2001/133757 ・・・・・・・with different alignment orientations

G02F 2001/133761 ・・・・・・・with different pretilt angles

G02F 2001/133765 ・・・・・・without a surface treatment

G02F 2001/133769 ・・・・・・comprising an active, e.g. switchable alignment layer

G02F 2001/133773 ・・・・・・The alignment material or treatment is different for the two opposite substrates

G02F 2001/133776 ・・・・・・having structures i.e. unevenness locally influencing the alignment

G02F 2001/13378 ・・・・・・{by treatment of the surface, e.g. embossing, rubbing, light irradiation (G02F 1/133711, G02F 1/133734, G02F 1/133753 take precedence)}

G02F 2001/133792 ・・・・・・・by etching

G02F 2001/133796 ・・・・・・having conducting property

G02F 2001/1339 ・・・・・Gaskets; Spacers, {also spacers with conducting properties (electric line connectors H01R)}; Sealing of the cell

G02F 2001/13396 ・・・・・・Spacers having different sizes

G02F 2001/13398 ・・・・・・Materials and properties of the spacer

G02F 2001/1341 ・・・・・Filling or closing of the cell {(G02F 1/133365, G02F 1/1334 take precedence)}

G02F 2001/13415 ・・・・・・Drop filling process

G02F 2001/1343 ・・・・・Electrodes {(reflective electrodes G02F 1/133553)}

G02F 2001/134309 ・・・・・・{characterised by their geometrical arrangement (G09F 9/302 takes precedence)}

G02F 2001/134318 ・・・・・・・having a patterned common electrode

G02F 2001/134345 ・・・・・・・Subdivided pixels, e.g. grey scale, redundancy

G02F 2001/134354 ・・・・・・・・the sub-pixels being capacitively coupled

G02F 2001/134372 ・・・・・・・for fringe field switching [FFS] where the common electrode is not patterned, e.g. planar

G02F 2001/134381 ・・・・・・・Hybrid switching mode, i.e. for applying an electric field both parallel and orthogonal to the substrates

G02F 2001/1345 ・・・・・Conductors connecting electrodes to cell terminals

G02F 2001/13456 ・・・・・・cell terminals on one side of the display only

G02F 2001/1347 ・・・・・Arrangement of liquid crystal layers or cells in which the final condition of one light beam is achieved by the addition of the effects of two or more layers or cells {(colour projection displays with liquid crystal valves H04N 9/3197)}

G02F 2001/13478 ・・・・・・based on selective reflection

G02F 2001/135 ・・・・Liquid crystal cells structurally associated with a photoconducting or a ferro-electric layer, the properties of which can be optically or electrically varied {(G02F 1/133348 takes precedence)}

G02F 2001/1351 ・・・・・light-absorbing or blocking layer

G02F 2001/1352 ・・・・・light-reflecting layer

G02F 2001/1354 ・・・・・{having a particular photoconducting structure or material}

G02F 2001/1355 ・・・・・・material or manufacturing process thereof

G02F 2001/1357 ・・・・・electrode structure

G02F 2001/136 ・・・・Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit (G02F 1/135 takes precedence)

G02F 2001/13606 ・・・・・having means for reducing parasitic capacitance

G02F 2001/13613 ・・・・・the semiconductor element is formed on a first substrate and thereafter transferred to the final cell substrate

G02F 2001/1362 ・・・・・Active matrix addressed cells {(G02F 1/134336, G02F 1/134363 take precedence)}

G02F 2001/136218 ・・・・・・Shield electrode

G02F 2001/136222 ・・・・・・Color filter incorporated in the active matrix substrate

G02F 2001/136231 ・・・・・・for reducing the number of lithographic steps

G02F 2001/136236 ・・・・・・・using a gray or half tone lithographic process

G02F 2001/13624 ・・・・・・{having more than one switching element per pixel}

G02F 2001/136245 ・・・・・・・having complementary transistors

G02F 2001/13625 ・・・・・・Patterning using a multi-mask exposure

G02F 2001/136254 ・・・・・・Checking; Testing

G02F 2001/136259 ・・・・・・{Repairing; Defects}

G02F 2001/136263 ・・・・・・・Line defect

G02F 2001/136268 ・・・・・・・Switch defect

G02F 2001/136272 ・・・・・・・Auxiliary line

G02F 2001/136277 ・・・・・・{formed on a semiconductor substrate, e.g. silicon}

G02F 2001/136281 ・・・・・・・having a transmissive semiconductor substrate

G02F 2001/136286 ・・・・・・{Wiring, e.g. gate line, drain line}

G02F 2001/13629 ・・・・・・・Multi-layer wirings

G02F 2001/136295 ・・・・・・・Materials; Compositions; Methods of manufacturing

G02F 2001/1368 ・・・・・・in which the switching element is a three-electrode device {(G02F 1/136277 takes precedence)}

G02F 2001/13685 ・・・・・・・Top gate

G02F 2001/137 ・・・characterised by a particular electro- or magneto-optical effect, e.g. field-induced phase transition, orientation effect, guest-host interaction, dynamic scattering

G02F 2001/13706 ・・・・the LC having positive dielectric anisotropy

G02F 2001/13712 ・・・・the LC having negative dielectric anisotropy

G02F 2001/13756 ・・・・the liquid crystal selectively assuming a light-scattering state (G02F 1/1334, G02F 1/13718 take precedence)

G02F 2001/13775 ・・・・Polymer stabilized liquid crystal layers

G02F 2001/13787 ・・・・Hybrid alignment cells (G02F 1/1393 takes precedence)

G02F 2001/13793 ・・・・Blue phases

G02F 2001/139 ・・・・based on orientation effects in which the liquid crystal remains transparent

G02F 2001/1396 ・・・・・{the liquid crystal being selectively controlled between a twisted state and a non-twisted state, e.g. TN-LC cell (G02F 1/141 takes precedence)}

G02F 2001/1398 ・・・・・・the twist being below 90?C

G02F 2001/141 ・・・・・using ferroelectric liquid crystals

G02F 2001/1412 ・・・・・・Antiferroelectric liquid crystals

G02F 2001/1414 ・・・・・・Deformed helix ferroelectric (DHL)

G02F 2001/15 ・・based on electrochromic elements {(electrochromic materials C09K 9/00)}

G02F 2001/1502 ・・・complementary cell

G02F 2001/1504 ・・・・having an inorganic electrochromic layer and a second solid organic electrochromic layer

G02F 2001/151 ・・・the electrochromic material comprises ferrocene compounds

G02F 2001/1512 ・・・the electrochromic layer comprises a mixture of anodic and cathodic compounds

G02F 2001/1515 ・・・the electrochromic material is made of polymer

G02F 2001/1517 ・・・based on cyano complex compound, e.g. Prussian blue

G02F 2001/1519 ・・・the electrolyte is made of polymer

G02F 2001/153 ・・・Constructional arrangements

G02F 2001/1533 ・・・・{structural features not otherwise provided for }

G02F 2001/1536 ・・・・・additional, e.g. protective, layer inside the cell

G02F 2001/155 ・・・・Electrodes

G02F 2001/1552 ・・・・・Inner electrode, e.g. the electrochromic layer being sandwiched between the inner electrode and the support substrate---- this group, now to be changed, should already been created by implementation of a previous

G02F 2001/1555 ・・・・・Counter electrode

G02F 2001/1557 ・・・・・Side by side arrangements of working and counter electrodes

G02F 2001/163 ・・・Operation of electrochromic cells; Circuit arrangements

G02F 2001/1635 ・・・・the pixel comprises active switching elements, e.g. TFT

G02F 2001/167 ・・based on electrophoresis

G02F 2001/1672 ・・・of the microcup type [N0707

G02F 2001/1674 ・・・comprising a dry toner particle

G02F 2001/1676 ・・・having a particular electrode [N0707

G02F 2001/1678 ・・・having a particular composition or particle type [N0707

G02F 2001/21 ・・by interference

G02F 2001/211 ・・・Sagnac type

G02F 2001/212 ・・・Mach-Zender type

G02F 2001/213 ・・・Fabry-Perot type

G02F 2001/215 ・・・Michelson type

G02F 2001/217 ・・・Multi mode interference type

G02F 2001/29 ・for the control of the position or the direction of light beams, i.e deflection ({optical coupling means G02B 6/26; optical-mechanical scanning in general G02B 26/10}; static stores with electric or magnetic read-in and optical read-out G11C; lasers provided with means to change the location from which, or the direction in which, laser radiation is emitted H01S 3/101)

G02F 2001/291 ・・Two-dimensional analog deflection

G02F 2001/294 ・・Variable focal length device

G02F 2001/31 ・・Digital deflection, {i.e. optical switching}(G02F 1/33 takes precedence)

G02F 2001/311 ・・・Cascade arrangement of plural switches

G02F 2001/313 ・・・in an optical waveguide structure

G02F 2001/3132 ・・・・{of directional coupler type (all-optical modulation, gating or switching using a non-linear directional coupler G02F 1/3521)}

G02F 2001/3135 ・・・・・vertical structure

G02F 2001/35 ・Non-linear optics (optical bistable devices G02F 3/02; lasers using stimulated Brillouin or Raman effect H01S 3/30)

G02F 2001/3501 ・・{Constructional arrangements of non-linear optical devices, e.g. shape of non-linear crystals (constructional arrangements of electro-optic devices G02F 1/0305)}

G02F 2001/3503 ・・・Structural association of optical elements, e.g. lenses, with the nonlinear optical device

G02F 2001/3505 ・・・Coatings; Housings; Supports

G02F 2001/3507 ・・・Arrangements comprising two or more nonlinear optical devices

G02F 2001/3509 ・・・Shape, e.g. shape of end face

G02F 2001/3528 ・・for producing a supercontinuum

G02F 2001/353 ・・{Frequency conversion, i.e. wherein a light beam with frequency components different from those of the incident light beams is generated (second harmonic generation G02F 1/37; optical parametric generation or amplification G02F 1/39; transferring the modulation of modulated light G02F 2/004; optical pumping of a laser by another laser H01S 3/094; nonlinear optical devices inside a laser cavity H01S 3/108)}

G02F 2001/354 ・・・Third or higher harmonic generation

G02F 2001/3542 ・・・Multi-pass arrangements, i.e. arrangements to pass light a plurality of times through the same element, e.g. by using an enhancement cavity

G02F 2001/3544 ・・・{Particular phase matching techniques}

G02F 2001/3546 ・・・・Active phase matching, e.g. by electro- or thermo-optic tuning

G02F 2001/3548 ・・・・Quasi-phase-matching (QPM), e.g. using a periodic domain inverted structure

G02F 2001/37 ・・for second-harmonic generation {(G02F 1/3532 takes precedence)}

G02F 2001/372 ・・・means for homogenizing the output beam

G02F 2001/374 ・・・Cerenkov radiation

G02F 2001/39 ・・for parametric generation or amplification of light, infra-red or ultra-violet waves ({G02F 1/3532 takes precedence;} electrical parametric amplifiers H03F 7/00)

G02F 2001/392 ・・・Parametric amplification

G02F 2002/00 Demodulating light; Transferring the modulation of modulated light; Frequency-changing of light (G02F 1/35 takes precedence; photoelectric detecting or measuring devices G01J, H01J 40/00, H01L 31/00; demodulating laser arrangements {e.g. switching, gating}H01S 3/10; demodulation or transference of modulation of modulated electro-magnetic waves in general H03D 9/00)

G02F 2002/004 ・{Transferring the modulation of modulated light, i.e. transferring the information from one optical carrier of a first wavelength to a second optical carrier of a second wavelength, e.g. all-optical wavelength converter}

G02F 2002/006 ・・All-optical wavelength conversion

G02F 2002/008 ・・Opto-electronic wavelength conversion, i.e. involving photo-detection of the first optical carrier

G02F 2201/00 Constructional arrangements not provided for in groups G02F 1/00 to G02F 7/00

G02F 2201/02 ・fibre

G02F 2201/04 ・monomode

G02F 2201/05 ・multimode

G02F 2201/06 ・integrated waveguide

G02F 2201/063 ・・ridge; rib; strip loaded

G02F 2201/066 ・・channel; buried

G02F 2201/07 ・buffer layer

G02F 2201/08 ・light absorbing layer

G02F 2201/083 ・・infra-red absorbing

G02F 2201/086 ・・UV absorbing

G02F 2201/12 ・electrode

G02F 2201/121 ・・common or background

G02F 2201/122 ・・having a particular pattern

G02F 2201/123 ・・pixel

G02F 2201/124 ・・interdigital

G02F 2201/125 ・・delta-beta

G02F 2201/126 ・・push-pull

G02F 2201/127 ・・travelling wave

G02F 2201/128 ・・field shaping

G02F 2201/14 ・asymmetric

G02F 2201/15 ・periodic

G02F 2201/16 ・series; tandem

G02F 2201/17 ・Multi-pass arrangements, i.e. arrangements to pass light a plurality of times through the same element, e.g. by using an enhancement cavity

G02F 2201/18 ・parallel

G02F 2201/20 ・delay line

G02F 2201/205 ・・of fibre type

G02F 2201/30 ・grating

G02F 2201/302 ・・grating coupler

G02F 2201/305 ・・diffraction grating

G02F 2201/307 ・・Reflective grating, i.e. Bragg grating

G02F 2201/34 ・reflector

G02F 2201/343 ・・cholesteric liquid crystal reflector

G02F 2201/346 ・・distributed (Bragg) reflector

G02F 2201/36 ・Airflow channels, e.g. constructional arrangements facilitating the flow of air

G02F 2201/38 ・Anti-reflection arrangements

G02F 2201/40 ・Arrangements for improving the aperture ratio

G02F 2201/42 ・Arrangements for providing conduction through an insulating substrate

G02F 2201/44 ・Arrangements combining different electro-active layers, e.g. electrochromic, liquid crystal or electroluminescent layers

G02F 2201/46 ・Fixing elements

G02F 2201/465 ・・Snap -fit

G02F 2201/48 ・Flattening arrangements

G02F 2201/50 ・Protective arrangements

G02F 2201/501 ・・Blocking layers, e.g. against migration of ions

G02F 2201/503 ・・Arrangements improving the resistance to shock

G02F 2201/505 ・・Arrangements improving the resistance to acoustic resonance like noise

G02F 2201/506 ・・Repairing, e.g. with redundant arrangement against defective part

G02F 2201/508 ・・・Pseudo repairing, e.g. a defective part is brought into a condition in which it does not disturb the functioning of the device

G02F 2201/52 ・RGB geometrical arrangements

G02F 2201/54 ・Arrangements for reducing warping-twist

G02F 2201/56 ・Substrates having a particular shape, e.g. non-rectangular

G02F 2201/58 ・Arrangements comprising a monitoring photodetector

G02F 2202/00 Materials and properties

G02F 2202/01 ・dipole

G02F 2202/02 ・organic material

G02F 2202/021 ・・low molecular weight

G02F 2202/022 ・・polymeric

G02F 2202/023 ・・・curable

G02F 2202/025 ・・・・thermocurable

G02F 2202/026 ・・charge transfer complex

G02F 2202/027 ・・Langmuir-Blodgett film

G02F 2202/028 ・・photobleached

G02F 2202/04 ・dye

G02F 2202/043 ・・pleochroic

G02F 2202/046 ・・fluorescent

G02F 2202/06 ・dopant

G02F 2202/07 ・poled

G02F 2202/08 ・glass transition temperature

G02F 2202/09 ・inorganic glass

G02F 2202/10 ・semiconductor

G02F 2202/101 ・・GaXAs and alloy

G02F 2202/102 ・・InXP and alloy

G02F 2202/103 ・・a-Si

G02F 2202/104 ・・poly-Si

G02F 2202/105 ・・single crystal Si

G02F 2202/106 ・・CdXSe or CdXTe and alloys

G02F 2202/107 ・・ZnXS or ZnXSe and alloys

G02F 2202/108 ・・quantum wells

G02F 2202/12 ・photoconductor

G02F 2202/13 ・photorefractive

G02F 2202/14 ・photochromic

G02F 2202/16 ・conductive

G02F 2202/20 ・LiNb03, LiTa03

G02F 2202/22 ・Antistatic materials or arrangements

G02F 2202/28 ・Adhesive materials or arrangements

G02F 2202/30 ・Metamaterials

G02F 2202/32 ・Photonic crystals

G02F 2202/34 ・Metal hydrides materials

G02F 2202/36 ・Micro or nano materials

G02F 2202/38 ・Sol-gel materials

G02F 2202/40 ・Materials having a particular birefringence, retardation

G02F 2202/42 ・Materials having a particular dielectric constant

G02F 2202/99 ・Test HW

G02F 2203/00 Function characteristic

G02F 2203/01 ・transmissive

G02F 2203/02 ・reflective

G02F 2203/023 ・・total internal reflection

G02F 2203/026 ・・attenuated or frustated internal reflection

G02F 2203/03 ・scattering

G02F 2203/04 ・wavelength independent

G02F 2203/05 ・wavelength dependent

G02F 2203/055 ・・wavelength filtering

G02F 2203/06 ・Polarisation independent

G02F 2203/07 ・Polarisation dependent

G02F 2203/09 ・transflective

G02F 2203/10 ・plasmon

G02F 2203/11 ・involving infrared radiation

G02F 2203/12 ・spatial light modulator

G02F 2203/13 ・involving THZ radiation

G02F 2203/15 ・involving resonance effects, e.g. resonantly enhanced interaction

G02F 2203/16 ・involving spin polarization effects

G02F 2203/17 ・involving soliton waves

G02F 2203/18 ・adaptive optics, e.g. wavefront correction

G02F 2203/19 ・linearised modulation; reduction of harmonic distortions

G02F 2203/20 ・Intrinsic phase difference, i.e. optical bias, of an optical modulator; Methods for the pre-set thereof

G02F 2203/21 ・Thermal instability, i.e. DC drift, of an optical modulator; Arrangements or methods for the reduction thereof

G02F 2203/22 ・diffractive

G02F 2203/24 ・beam steering

G02F 2203/25 ・Frequency chirping of an optical modulator; Arrangements or methods for the pre-set or tuning thereof

G02F 2203/255 ・・Negative chirp

G02F 2203/26 ・Pulse shaping; Apparatus or methods therefor

G02F 2203/28 ・focussing or defocussing

G02F 2203/30 ・Gray scale

G02F 2203/34 ・Colour display without the use of colour mosaic filters

G02F 2203/48 ・Variable attenuator

G02F 2203/50 ・Phase-only modulation

G02F 2203/52 ・Optical limiters

G02F 2203/54 ・Optical pulse train (comb) synthesizer

G02F 2203/56 ・Frequency comb synthesizer

G02F 2203/58 ・Multi-wavelength, e.g. operation of the device at a plurality of wavelengths

G02F 2203/585 ・・Add/drop devices

G02F 2203/60 ・Temperature independent

G02F 2203/62 ・Switchable arrangements whereby the element being usually not switchable

G02F 2203/64 ・Normally black display, i.e. the off state being black

G02F 2203/66 ・Normally white display, i.e. the off state being white

G02F 2203/68 ・Green display, e.g. recycling, reduction of harmful substances

G02F 2203/69 ・Arrangements or methods for testing or calibrating a device

G02F 2203/70 ・Semiconductor optical amplifier [SOA] used in a device covered by G02F

G02F 2413/00 Indexing scheme related to G02F 1/13363P, i.e. to birefringent elements, e.g. for optical compensation, characterised by the number, position, orientation or value of the compensation plates

G02F 2413/01 ・Number of plates being 1

G02F 2413/02 ・Number of plates being 2

G02F 2413/03 ・Number of plates being 3

G02F 2413/04 ・Number of plates greater than or equal to 4

G02F 2413/05 ・Single plate on one side of the LC cell

G02F 2413/06 ・Two plates on one side of the LC cell

G02F 2413/07 ・All plates on one side of the LC cell

G02F 2413/08 ・with a particular optical axis orientation

G02F 2413/09 ・with a spatial distribution of the retardation value

G02F 2413/10 ・with refractive index ellipsoid inclined, or tilted, relative to the LC-layer surface O plate

G02F 2413/105 ・・with varying inclination in thickness direction, e.g. hybrid oriented discotic LC

G02F 2413/11 ・The refractive index Nz perpendicular to the element surface being different from in-plane refractive indices Nx an Ny , e.g. C plate

G02F 2413/12 ・Biaxial compensators

G02F 2413/13 ・Positive birefingence

G02F 2413/14 ・Negative birefingence

G02F 2413/15 ・with twisted orientation, e.g. comprising helically oriented LC-molecules or a plurality of twisted birefringent sublayers